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PVA Nodular Roller Brush

2 year ago
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Product details

 nodular PVA brush Description:

Various cleaning and processing steps are required during semiconductor wafer manufacturing,Nodular roller is used for semiconductor field, hard disk, wafer industrial for the surface cleaning and treatment such as remove the dust,residule and chemical on the wafer surface to ensure the surface smooth and cleanliness, besides this, it also used for wafer water absorb and moisturize. It have unique shape which is customized by your requirement to suit for your machine.PVA Brush roller also has the feature of high cleanness without dust drop out, it's most people's best prefer.  PVA Brush

 

Physical characteristics of PVA Brush roller

30% compressive stress 110-120 g/cm2
Apparent Density     0.11-0.13 g/cm3
Tensile Strength     4.7-5.6 kgf/cm2
Elongation at Break
320%
Tearing Strength
2.3 ~ 2.6 kgf/cm
Porosity
90 ~ 92%
AVG pore size
100 ~ 130um
 

 

Chemistry solvent or detergent effects

 

Chemistry solvent or detergent Effects
3% sodium hydroxide(NaOH) harder
3% Potassium Hydroxide(KOH) harder
Dehydroacetic Acid Yellowish appearance
5% Sulfuric Acid A little shrunk
TCL300 2% Light yellowdish appearance
50% eTHANOL Softer

Pva Brush

Storage environment condition for PVA Brush:

 

1.Temperature: Room temperature

2. Humidity:30-50% relative humidity

3. Exterior package integrity and avoid sunlight

4. Max storage shelf life is 12 month after manufactured data (in standard storage environment condition)

5. Suggest to use under 6 months to get best performance.

 

Nodular Brush 3

Nodular BrushNodular Brush

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